Copper Nanowires Preparation and Field Electron Emission Properties

摘要：

　　Copper (Cu) nanowires films are deposited on the molybdenum film-coated Al2O3 ceramic substrates by using the electron beam vapor deposition technique.The films were characterized by optical microscopy,scanning electron microscope,x-ray diffraction spectrum and energy dispersive spectrum.The surface morphology show that the Cu nanowires have excellent length-to-diameter ratio of~300,and each Cu nanowires diameter is uniform.The field electron emission measurements of Cu nanowires films were also carried out showing the turn on field as low as 2.5 V/μm and the average current density of 0.10 mA/cm2 at electric field of 10.8 V/μm were obtained from a broad uniform emission screen over 3.0 cm2.

关键词： Copper nanowires films electron beam vapor deposition field electron emission

作者: Li-jun Wang Can Yang Zi Wang Xiao-fei Liu Xiao-ping Wang

作者单位: College of Science,University of Shanghai for Science and Technology,Shanghai,China 200093 School of transportation engineering,Tongji University,shanghai,China 200092

会议类型: 国际会议

会议名称: 2012 Workshop on Inorganic Thin Films and Coatings (2012年无机薄膜与涂层学术研讨会)

会议地点: 桂林

会议语种:英文

页码: 298-301

在线出版日期: 2012-07-16（万方平台首次上网日期，不代表论文的发表时间）