The Motion-Overlap Scheme for Reducing the Time between Continuous Scans of Wafer Stage for Step-and-Scan Lithography
During the exposure process of a step-and-scan lithography,the transitional time between continuous scans does not produce production efficiency in which no scanning occurs.To minimize the transitional time and therefore to improve the productivity we introduce the motion-overlap scheme,which inserts a step-move between the overrun phase and the phase before exposure of next field along the scanning direction for wafer stage during the continuous exposure process.The simulation results show that the motion-overlap scheme enables the total time of two continuous scans of four different exposure field sizes reduce 8.28%,7.11%,5.87% and 4.53%,respectively,compared with the conventional motion planning method.This indicates that the theoretical derivation of motion-overlap planning method is effective.
Step-and-scan lithography motion-overlap scheme step transitional time productivity
Hai-hong PAN Lin CHEN Yun-fei ZHOU
Guangxi Key Laboratory of Manufacturing System & Advanced Manufacturing Technology, College of Mecha The School of Mechanical Science & Engineering, Huazhong University of Science & Technology,Wuhan 43
国际会议
台湾
英文
110-115
2011-12-11（万方平台首次上网日期，不代表论文的发表时间）