Preparation of Patterned BiFeO3 Thin Films on the Functional Silicon Substrates Surface

摘要：

　　Patterned octadecyltrichlorosilane (OTS) self-assembled monolayers (SAMs) were fabricated on silicon substrates,utilizing short wave UV irradiation meter (λ =184.9 nm) as the photolithograph apparatus under the cover of the photomask.The patterned BiFeO3 were prepared on the functional OTS-SAMs by sol-gel method.The characterization of the samples patterns was carried out by various techniques,including X-ray diffraction,X-ray photoelectron spectroscopy,field emission scanning electron microscopy,atomic force microscopy and energy disperse spectroscopy.The results indicate that the pattern BiFeO3 thin films were successfully prepared on the functional OTS-SAMs by sol-gel method and the thin films were BiFeO3 thin films with hexagonal perovskite distorted structure which has clear boundaries and 200 μm deposited lines width.

关键词： BiFeO3 thin films OTS-SAMs Patterning

作者: Guoqiang Tan Meng Cheng Yan Wang Lei Cheng Ao Xia

作者单位: Shaanxi University of Science and Technology,Xian 710021,China

会议类型: 国际会议

会议名称: The Seventh China International Conference on High-Performance Ceramics (第七届先进陶瓷国际研讨会(CICC-7))

会议地点: 厦门

会议语种:英文

页码: 1731-1735

在线出版日期: 2011-11-04（万方平台首次上网日期，不代表论文的发表时间）