Top-down formation of GaN nanocone arrays for application in field emission
We present a novel method to fabricate uniform GaN nanocone arrays (GNA) using Nickel-nanoisland masks.The nanoscale conelike arrays with high density can be formed over the entire 2-inch wafer by inductively couple plasma etching.The results of X-ray diffraction exhibit significant decrease on the (102) reflection in GaN sample with the GNA.Field-emission measurements show that the GNA with sharp tips have a turn-on field of~ 5.5 V/μ m.It is believed that the high aspect ratio resulting from the conelike morphology is responsible for the enhancement of the field-emission properties of GNA.
nanocone GaN field emission ICP
Xinzhong Wang Guanghui Yu Shiguo Li Chengguo Wu
Department of Electronics and Communications Technology, Shenzhen Institute of Information Technolog State Key laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and College of Sciences, PLA University of Science and Technology, Nanjing, 210007, China
国际会议
重庆
英文
2514-2518
2010-12-11(万方平台首次上网日期,不代表论文的发表时间)