Detection of Amorphous Silica in Air-Oxidized Ti3SiC2 at 500-1000℃ by NMR and SIMS
The use of secondary-ion mass spectrometry (SIMS),nuclear magnetic resonance (NMR) and transmission electron microscopy (TEM) to detect the existence of amorphous silica in Ti3SiC2 oxidised at 500-1000℃ is described.The formation of an amorphous SiO2 layer and its growth in thickness with temperature was monitored using dynamic SIMS.Results of NMR and TEM verify for the first time the direct evidence of amorphous silica formation during the oxidation of Ti3SiC2 at ≤ 1000℃.
Oxidation amorphous phase Ti3SiC2 SIMS NMR
W.K.Pang I.M.Low J.V.Hanna
Centre for Materials Research, Department of Imaging and Applied Physics, Curtin University of Techn Department of Physics, University of Warwick, Gibbet Hill Rd., Coventry CV4 7AL, UK
国际会议
The Sixth China International Conference on High-Performance Ceramics(第六届中国先进陶瓷国际研讨会(CICC-6))
哈尔滨
英文
169-172
2009-08-16(万方平台首次上网日期,不代表论文的发表时间)