会议专题

Ultraviolet Photoluminescence on Nano-Crystalline 6H-SiC

  SiC films were prepared by HFCVD technique on (111) Si substrate.The composition and the structure of the films were investigated using EDX,XRD and transient fluorescence.Results indicated the films deposited were nanocrystalline and the calculation of the grain size gave a further confirmation.PL measurement of the present films showed that there existed a strong ultraviolet emission at room temperature.

SiC Nanocrystalline HFCVD Ultraviolet emission

Hui Wang Tongwei Li Zhengxin Tang Jinghan You Xiangru Liu Qingdong Chen

School of Science,Henan University of Science and Technology,Luoyang 471003,China

国际会议

The Fifth China International Conference on High-Performance Ceramics (第五届先进陶瓷国际研讨会(CICC-5))

长沙

英文

319-321

2007-05-10(万方平台首次上网日期,不代表论文的发表时间)