Gallium and Nitrogen Co-doped ZnO Thin Films by Pulsed Laser Deposition
Pulsed laser deposition (PLD) technique is a very powerful method for fabricating various oxide thin films due to its native merits.In this study,gallium and nitrogen co-doped ZnO thin films (0.1 at.%) were deposited at different temperatures (100-600℃) on sapphire (001) s ubstrates by using PLD.X-ray diffractometer,atomic force microscope,spectrophotometer,and spectrometer were used to characterize the structural,the morphological and the optical properties of the thin films.Hall measurements were also carried out to identify the electrical properties of the thin films.
ZnO Thin Films Doping Pulsed Laser Deposition
G.X.Liu F.K.Shan B.C.Shin W.J.Lee
Electronic Ceramics Center,DongEui University,Busan 614-714,South Korea
国际会议
The Fifth China International Conference on High-Performance Ceramics (第五届先进陶瓷国际研讨会(CICC-5))
长沙
英文
322-325
2007-05-10(万方平台首次上网日期,不代表论文的发表时间)