Effects of Deposition Temperature on the Growth Characteristics of CVD SiC Coatings
The effects of deposition temperature on the growth characteristics of CVD SiC coatings were investigated.CVD SiC coatings were made by pyrolysis ofmethyltrichlorosilane (MTS) in hydrogen at a low pressure of 5kPa.The ratio of MTS to hydrogen was 1/12.The deposition temperatures were varied from 1373K to 1503K.Optical microscope and SEM were used to observe the surface morphology and microstructure of the coatings.XRD was used for characterization of the phase composition.Results indicated that the deposition rate and the surface roughness varied with deposition temperature.At 1373K,the deposited grains were mainly equiaxed with the crystallite size of 22 nm.However,when the deposition temperature was 1503K,the SiC grains were mainly showed faceted columnar structure with the crystal lite size of 32 nm.Grain size increased with the increase of deposition temperature.
CVD SiC Coating Deposition Temperature
Yanli Huo Yufeng Chen
China Building Materials Academy,Chaoyang District,Beijing10024,China
国际会议
The Fifth China International Conference on High-Performance Ceramics (第五届先进陶瓷国际研讨会(CICC-5))
长沙
英文
846-848
2007-05-10（万方平台首次上网日期，不代表论文的发表时间）