Pressure-Dependent Characteristics and Properties of Al2O3-SiO2 Thin Films Deposited on PET
Transparent and hard Al2O3-SiO2 thin films have been deposited on PET substrate by E-beam evaporation with oxygen pressure ranging from 1× 10-5 to 1× 10-3 Torr at room temperature.Pressuredependent characteristics were analyzed by X-ray diffraction (XRD),scanning electron microscopy (SEM) and energy dispersive spectrometry (EDS),meanwhile,apparent transmittance and hardness of thin films were evaluated by uv-visible spectroscopy (UVs) and nanoidentor,respectively.The XRD results showed that the amorphous Al2O3-SiO2 film was obtained although the intensity of the broaden peak decreased with oxygen pressure increasing.The similar morphologies and composition were obtained in pressure range.Good apparent transmittance was found,which higher than 85% in the pressure range.Apparent hardness of PET was effectively improved from 2.77 to 5.7-6.1 GPa depending on oxygen pressure.However,the critical load of Al2O3-SiO2 film slightly decreased with oxygen pressure increasing.
Al2O3-SiO2 film E-Beam evaporation Transmittance Hardness Adhesion
Hong-Hsin Huang Yuan-Shing Liu Cheng-Fu Yang Yen-Ming Chen Cheng-Yi Chen Moo-Ching Wang
Department of Electrical Engineering,Cheng Shiu University,840,Cheng Ching Rd.,Niaosong,Kaohsiung 83 Department of Chemical and Materials Engineering,National University of Kaohsiung,700,Kaohsiung Univ Faculty of Fragrance and Cosmetics,Kaohsiung Medical University,100,Shi-Chuan 1st Road,Kaohsiung 807
国际会议
The Fifth China International Conference on High-Performance Ceramics (第五届先进陶瓷国际研讨会(CICC-5))
长沙
英文
1354-1357
2007-05-10（万方平台首次上网日期，不代表论文的发表时间）