Preparation of antireflective SiO2 films on glass via sol-gel process
In this paper,low-index silica Anti-reflective (AR) coatings on glass substrate were prepared and optimized through dipping-coating process by sol-gel method.Different indexes and peak wavelengths of the film could be achieved by changing dipping rate and the reagent ratio.Additionally,the production cycle could be shortened by diluting the high concentration sols at the cost of better film thickness.The result shows that at the optimal dipping rate and the reagent ratio,the transmittance of the coated glass has increased 5.78% over a wavelength range of 400-1100 nm and a 3.91% increase of low-iron patterned glass with a peak wavelength at 690 nm.Moreover,the method which highly concentrated sols were applied to accelerate the reaction and dilute the sols before coating can shorten the aging time from 4-6 days to 1-2 days,which should bring convenience for industry application.
Yao Chen Jianhui Guo Ruijiang Hong
Institute for Solar Energy Systems, Sun Yat-Sen University, Guangzhou 510006, China
国际会议
The 22nd International Photovoltaic Science and Engineering Conference (第22届国际光伏科学与工程会议)
杭州
英文
1-5
2012-11-05（万方平台首次上网日期，不代表论文的发表时间）