Fabrication of sub-micro metal tips for in-plane field emission research

摘要：

　　Fabrication of a novel in-plane field emission diode structure is presented.Sub-micro metal tips were obtained using a two-step lithography method.The Minimum width of the metal tips was less than 100nm,and the minimum spacing of 145.7nm was obtained.The I-V characters in atmospheric environment before and after the silicon etching were measured.

关键词： metal tips sub-micro in-plane field emission Electron Beam lithography

作者: Li-Feng Wang Lei Han Jie-Ying Tang Jing Song

作者单位: Key Laboratory of MEMS of the Ministry of Education, Southeast University, Nanjing, China

会议类型: 国际会议

会议名称: 中国微米纳米技术学会第14届学术年会、第3届国际年会暨第6届微米纳米技术“创新与产业化国际研讨与展览会(CSMNT2012 & ICMAN2012)

会议地点: 杭州

会议语种:英文

页码: 1-5

在线出版日期: 2012-11-04（万方平台首次上网日期，不代表论文的发表时间）