Research on formation mechanism of Black Silicon based on matter wave
Most of research on formation mechanism of black silicon stays in the stage of experimental analysis.Consequently,it is quite difficult to perceive the mechanism of its formation process theoretically.In this paper,Quantum Mechanics is involved in our research on mechanism of how black silicon is formed in the fabrication process based on DRIE.Satisfying result is obtained through our simulation: Pillar structures with spacing raging from 500nm to 550nm can be formed when there exist particles with single momentum size in emulated experiment environment; With further efforts,more complicated pillar structures are obtained assuming that there exist particles with two sizes of momentum.By comparing with SEM image of black silicon,the simulated pillar structures are quite similar with real black silicon in both spacing and height distribution.
Formation mechanism of Black Silicon Self-mask Method Quantum Mechanics
Wang Chen Zhu Fuyun Sun Mingzhu Zhang Haixia Zhao Xin
Insitute of Robotics and Automatic Information System, Nankai University, Tianjin, CHINA National Key Laboratory of Nano/Micro Fabrication Technology, Institute of Microelectronics,Peking U
国际会议
中国微米纳米技术学会第14届学术年会、第3届国际年会暨第6届微米纳米技术“创新与产业化国际研讨与展览会(CSMNT2012 & ICMAN2012)
杭州
英文
1-6
2012-11-04（万方平台首次上网日期，不代表论文的发表时间）