Three-dimensional Analysis of Divergence Aangle on Deposition of Chromium Atoms in Laser Standing Wave Field

摘要：

　　Three-dimensional analysis of the effects of atom beam divergence angle on the process of fabricating nano-grating is discussed based on the three-dimensional motion model of Cr atoms in Gaussian standing wave laser field.From the simulative results it can be seen that Atomic beam spreading plays an important role in determining the deposition nanometer quality,so the preparation of a high-collimated and transversely cooled atomic beam,typically under 0.6mrad,is essential to minimize the severely disadvantageous effects for deposition of atoms in laser standing wave

关键词： Atom lithography Divergence angle Laser standing wave

作者: Huang Jing Zhu Baohu Zhang Wentao

作者单位: Guizhou University for Nationalities, Guiyang, China, 55000 School of Materials Science and Engineering, Gulin University of Electronic Technology, Guilin,China 3School of Electrical Engineering and Automation, Guilin University of Electronic Technology,Guilin,

会议类型: 国际会议

会议名称: 中国微米纳米技术学会第14届学术年会、第3届国际年会暨第6届微米纳米技术“创新与产业化国际研讨与展览会(CSMNT2012 & ICMAN2012)

会议地点: 杭州

会议语种:英文

页码: 1-4

在线出版日期: 2012-11-04（万方平台首次上网日期，不代表论文的发表时间）