FabricatioFabrication of the hexagonal Si Nanorod arrays using the template of Polystyrene nanosphere in monolayer dispersion

摘要：

　　Silicon etching is an essential fabrication step in Micro/Nano-Electro-Mechanical Systems (M/NEMS).In this paper,the inductive coupled plasma (ICP) etching technology with using the monolayer polystyrene (PS) nanosphere as the template provides a feasible top-down dry etching method in silicon substrates.The size of the PS nanosphere templates coated on the silicon substrate was adjusted using O2 plasma etching and the subsequent ICP etching process was applied to produce the silicon nanorods (Si NRs) by alternatively employing etching gas SF6 and protective gas C4F8.The O2 plasma etching time on the template and the SF6/C4F8 flow rate for etching Si substrate were optimized in order to obtain the Si NR structures in the hexagonal morphologies with good verticality,uniformity and periodicity.

关键词： ICP PS nanospheres Si NRs

作者: Chuang Yue Jing Li Junyong Kang

作者单位: Department of Physics/Pen-Tung Sah Micro-Nano Institute of Science and Technology, XiamenUniversity, Xiamen, Fujian, 361005, China

会议类型: 国际会议

会议名称: 中国微米纳米技术学会第14届学术年会、第3届国际年会暨第6届微米纳米技术“创新与产业化国际研讨与展览会(CSMNT2012 & ICMAN2012)

会议地点: 杭州

会议语种:英文

页码: 1-6

在线出版日期: 2012-11-04（万方平台首次上网日期，不代表论文的发表时间）