Visualization of Resist Flow Fields in UV-nanoimprint Lithography by Using Defocusing Digital Particle Image Velocimetry

摘要：

　　The resist filling behaviour is crucial to the quality of the final imprinted pattern in NIL.To reveal the resist filling mechanism,a three-dimensional defocusing digital particle image velocimetry system was set up to realize the visualization of resist flow process.A set of three-dimensional particle tracking velocimetry (3D PTV) algorithm for motion trajectory and velocity vectors of specified particle sets is presented.Three-dimensional particle field and velocity field were plotted.The research results will help to understand the resist filling behavior.

关键词： NIL Filling behaviour Defocusing digital particle image velocimetry

作者: DU Jun WEI Zhengying LI Shize TANG Yiping

作者单位: State key Laboratory of Manufacturing System Engineering, Xian Jiaotong University, Xi’an 710049,China

会议类型: 国际会议

会议名称: 中国微米纳米技术学会第14届学术年会、第3届国际年会暨第6届微米纳米技术“创新与产业化国际研讨与展览会(CSMNT2012 & ICMAN2012)

会议地点: 杭州

会议语种:英文

页码: 1-4

在线出版日期: 2012-11-04（万方平台首次上网日期，不代表论文的发表时间）