Nitrogen content influence on optical properties of DC magnetron sputtered copper nitride films
Copper nitride films were prepared on glass substrates by DC magnetron sputtering at various nitrogen contents.The influence of nitrogen content on growth mode,surface morphology and the optical properties were studied.The X-ray diffraction measurements showed the films were composed of Cu and Cu4N crystallites at a low nitrogen content working pressure,while the structure of CuxN films conformed to the anti-ReO3 structure at a low nitrogen content working pressure and the preferred growth orientations of the Cu3N films changed from (111) Cu3N to (100) Cu3N.The transmittances of CuxN films increased with the increase of nitrogen content (r) in working gas flow from 0 to 0.6,while decreased when r increased from 0.6 to 0.9.Additionally,the lowest reflectivity of CuxN film was obtained at r = 0.6,which was favorable to be used in optical recording application.Meanwhile,the maximum band gap of 1.35 eV for CuxN film was also presented at r = 0.6.
Copper nitride Optical properties Magnetron sputtering
Shu-Yong Wang Ning-Yi Yuan andJian-Ning Ding
Center for low-dimensional materials, micro-nano devices and system, Changzhou University,Changzhou Center for low-dimensional materials, micro-nano devices and system, Changzhou University,Changzhou
国际会议
中国微米纳米技术学会第14届学术年会、第3届国际年会暨第6届微米纳米技术“创新与产业化国际研讨与展览会(CSMNT2012 & ICMAN2012)
杭州
英文
1-6
2012-11-04（万方平台首次上网日期，不代表论文的发表时间）