The Research of Micro-Nano Scale laser Patterning system based on DMD

摘要：

　　This paper presents the properties of the micro-nano scale laser patterning system based on DMD.The introduction of the excellent spatial light modulator--DMD provides a possibility for the patterning system to combine high resolution and accuracy with short writing time.The optical characteristics of the DMD-input imaging system are analyzed.An overlapping exposure method is proposed to obtain optical resolution enhancement and high fidelity of the input pattern.Based on this method an optical synthetic-aperture effect is realized without increasing the system complexity or decreasing the process efficiency.

关键词： laser patterning SLM DMD laser direct writing high precision positioning

作者: Jin Hu Dong-lin Pu Lin-sen Chen

作者单位: Research Institute of Optical Information and EngineeringSoochow UniversitySoochow, China

会议类型: 国际会议

会议名称: 中国微米纳米技术学会第14届学术年会、第3届国际年会暨第6届微米纳米技术“创新与产业化国际研讨与展览会(CSMNT2012 & ICMAN2012)

会议地点: 杭州

会议语种:英文

页码: 1-6

在线出版日期: 2012-11-04（万方平台首次上网日期，不代表论文的发表时间）