Controlled synthesis of surface-clean monolayer graphene

摘要：

　　We present the controlled synthesis of surface-clean monolayer graphene.Monolayer Graphene was achieved by mechanical exfoliation (ME) and chemical vapor deposition (CVD), and then transferred to SiO2 (300nm)/Si substrates.We noticed there were tape residues left on the surface of the ME graphene,and PMMA/photoresist residues left on the surface of the CVD graphene after the transferring and lithography process.Annealing method was used to clean all these kinds of residues.We investigated the annealing process in both vacuum and N2/H2 and found that N2/H2 was crucial for the removing of residues.AFM images and Raman spectra were taken to confirm the effect of the annealing.

关键词： Graphene exfoliation CVD annealing clean

作者: Xueshen Wang Jinjin Li Qing Zhong Yuan Zhong Mengke Zhao

作者单位: National Institute of Metrology, Beijing, China, 100013

会议类型: 国际会议

会议名称: 中国微米纳米技术学会第14届学术年会、第3届国际年会暨第6届微米纳米技术“创新与产业化国际研讨与展览会(CSMNT2012 & ICMAN2012)

会议地点: 杭州

会议语种:英文

页码: 1-6

在线出版日期: 2012-11-04（万方平台首次上网日期，不代表论文的发表时间）