Texturing Multi-Crystalline Silicon Wafer by Ultrasonic Standing Wave in Acid Etching

摘要：

　　As a renewable,clear and inexhaustible energy,solar energy receives much more attention and has partly substituted traditional energies in many fields.Multi-crystalline silicon plays an important role for its low cost,abundant reserves and excellent photoelectric conversion in solar cells.Mixed acid etching is an effectively method to texture the morphology on the surface of mc-Si,While stochastic etching between silicon and acids results in irregular texturing and high reflectivity.In this paper,ultrasonic standing wave is introduced into acid solution,which aid wet etching to texture on the surface of mc-Si by controlling distribution of atoms of acids.Scanning electron microscope experiment shows that the morphology on the surface of mc-Si textured by this method is similar to that of mono-crystalline silicon.And the average reflectivity is 8%,much lower than mixed acid etching.

关键词： Multi-crystalline silicon (mc-Si) texturing, ultrasonic standing wave micro/nano morphology reflectivity

作者: Yan Chao Liqun Wu

作者单位: School of Mechanical Engineering, Hangzhou Dianzi University, Hangzhou, Zhejiang, China

会议类型: 国际会议

会议名称: 中国微米纳米技术学会第14届学术年会、第3届国际年会暨第6届微米纳米技术“创新与产业化国际研讨与展览会(CSMNT2012 & ICMAN2012)

会议地点: 杭州

会议语种:英文

页码: 1-4

在线出版日期: 2012-11-04（万方平台首次上网日期，不代表论文的发表时间）