Compensation of Defocus Phase Aberrations in in-Situ off-Axis Digital Holographic Microscopy
Digital holographic microscopy allows fast,nondestructive,full field,high-resolution quantitative amplitude and phase contrast so that it is widely used in many applications.It is necessary to correct the phase aberrations of digital holographic microscopy during the precise measurement.In this paper,we present a new method for compensate the phase aberrations by using the cooperative process of the numerical simulation of the reference wave front and the adjustment of the reference beam.The numerical simulation of the reference wave front is used for getting the replica of the reference wave front and the adjustment of the reference beam is used for compensating the aberrations of the setup which lead a precise measurement.The surface profiles of two microstructures are measured for evaluating the feasibility of the compensation method.
digital holographic microscopy precise measurement phase aberration compensation method reference wave front
Hai Lei Ya-Nan Zeng Xiao-Dong Hu Xiao-Tang Hu
State Key Laboratory of Precision Measuring Technology and Instruments, Tianjin University, Tianjin, China
国际会议
天津
英文
162-167
2012-10-16（万方平台首次上网日期，不代表论文的发表时间）