Properties of Infrared High Reflectance Mo Film for Solar Selective Coatings by MF Sputtering
Mo thin films were prepared by Mid-Frequency twin target magnetron sputtering as the high reflectivity coating in high temperature solar selective coating.The structure and optical properties of the coatings were studied by X-ray diffraction,scanning electron microscopy and Fourier Transform Infrared Spectrometer and spectrophotometer,the optical constants were inversely calculated by Handley equation.The highest infrared reflectivity of 94% reached at the bias voltage of -150 V and sputtering current 12A of the Mo cathode source,which satisfy the requirement for low thermal emittance solar selective coating applications.The thin films with body centered cubic structure grew along the (110) surface as column crystal,optical constants of Mo thin film were similar with bulk Mo.The thermal emittance of the infrared high reflectance Mo based selective absorber coating can control in 0.15 (400℃).
Mo film MF magnetron sputtering Infrared high reflectance coating Solar selective coating
Liqing Zheng Fuyun Zhou Xungang Diao
School of Physics and Nuclear Energy Engineering, Beihang University; Beijing 100191,china Dongguan CAMDA new energy research institute, DongGuan GuangDong, 523407, china
国际会议
the Chinese Materials Congress 2012(2012年中国材料大会(CMC2012))
太原
英文
857-862
2012-07-13(万方平台首次上网日期,不代表论文的发表时间)