Photo-Electrochemical Etching of Macroporous Silicon Arrays Used in Silicon Microchannel Plates

摘要：

The current-voltage curve of an n-type silicon wafer was presented in aqueous HF. The critical current density JPS was discussed. The control technology of channel dimension was studied and realized by changing the etching current density according to the JPS and dark current density. The pore morphology influenced by the working voltage were studied and analyzed. The dependence of macropore morphology on the orientation of n-type silicon was studied. The tilt channels array with smooth pore wall can be prepared by adopting the <118> orientation silicon wafer, and can satisfy the demand of microchannel plates for tilt angles of 7-15 degrees. A macroporous silicon arrays with the very high aspect ratio was prepared by the photo-electrochemical etching process.

关键词： current density macroporous silicon arrays photo-electrochemical etching microchannel plates

作者: Guozheng Wang Zhenhua Jiang Yang Wang Cong Wang Jikai Yang Qingduo Duanmu

作者单位: School of science Changchun University of Science and Technology Changchun, China

会议类型: 国际会议

会议名称: 2012 International Conference on Optoelectronics and Microelectronics(2012光电子与微电子国际学术会议 2012 ICOM)

会议地点: 长春

会议语种:英文

页码: 486-489

在线出版日期: 2012-08-23（万方平台首次上网日期，不代表论文的发表时间）