Development of In-Situ Real-Time CD Monitoring and Control System through PEB Process
Real-time control is the trend for photoresist processing in the advanced lithography. In this paper we develop an in-situ ellipsometer integrated with a programmable thermal heating system, which could perform real-time monitoring and control for critical dimension (CD) latent image through the entire post-exposure bake (PEB) process. The inline ellipsometry measurements are fitted into an electromagnetic wave model built on the rigorous coupled-wave analysis (RCWA) theory for CD latent image characterization. Thereafter a real-time control scheme is proposed by applying the programmable thermal bake-plate. The experimental outcome demonstrates a significant improvement on the final CD result comparing to the conventional baking method.
Real-Time Control Ellipsometer Critical Dimension Post-Exposure Bake
Geng Yang Arthur Tay Weng Khuen Ho
Department of Electrical and Computer Engineering, National University of Singapore, Singapore, 117576
国际会议
The 24th Chinese Control and Decision Conference (第24届中国控制与决策学术年会 2012 CCDC)
太原
英文
3092-3097
2012-05-23（万方平台首次上网日期，不代表论文的发表时间）