213 W 500 MHz 4H-SiC Static Induction Transistor
Silicon carbide (SiC) SITs were fabricated using home-grown epi structures. The gate is a recessed gate - bottom contact (RG - B). We designed that the mesa space 2.7um and the gate channel is 1.2um. One cell has 400 source fingers and each source finger width is lOOum. lmm SiC SIT yielded a current density of 123mA/mm of drain current at a drain voltage of 20V. A maximum current density of 150 mA/mm was achieved with Vd=40V. The device blocking voltage with a gate bias of -16 V was 200 V. Packaged 24-cm devices were evaluated using amplifier circuits designed for class AB operations. A total power output in excess of 213 W was obtained with a power density of 8.5 W/cm and gain of 8.5 dB at 500 MHz under pulse operation.
SiC SIT RF Microwave
Chen Gang Wu Peng Bai Song Li Zheyang Li Yun Ni WeiJiang Li Yuzhu
Science and Technology on Monolithic Integrated Circuits and Modules Laboratory, Nanjing Electronic Devices Institute, Nanjing, China, 210016
国际会议
合肥
英文
3392-3395
2011-09-23(万方平台首次上网日期,不代表论文的发表时间)