PROPERTIES OF RF SPUTTERED ZNO THIN FILMS UNDER DIFFERENT OXYGEN FLUX

摘要：

The microstructures,optical,and mechanical properties of zinc oxide (ZnO) thin films deposited on glass substrates by rf magnetron sputtering were studied.Microslructures were examined using atomic force microscopy (AFM) and X-ray diffraction (XRD),respectively.Optical property was measured by photoluminescence spectrum.The mechanical properties were measured by nanoindentation.The crystalline structures of ZnO thin films are well ordered with high c-axis (002) orientations and the crystallinity is strongly affected by O2 flux.Surface morphologies of ZnO thin films are smooth and grains grow and distribute uniformly.The hardness and Youngs modulus of ZnO thin films are ranged from 8.2 to 10.4 GPa and 105 to 120 GPa,respectively.

关键词： thin film microstructure mechanical properties nanoindentation

作者: Z.S.Guo

作者单位: Shanghai Institute of Applied mathematics and Mechanics,Shanghai University,Shanghai 200072,China

会议类型: 国际会议

会议名称: The Third International Conference on Heterogeneous Material Mechanics(第三届国际非均匀材料力学会议)

会议地点: 上海

会议语种:英文

页码: 222-225

在线出版日期: 2011-05-22（万方平台首次上网日期，不代表论文的发表时间）