A simple texturization approach for mono-crystalline silicon solar cell with low TMAH concentration solution
Texturing for mono-crystalline silicon solar cell by chemical anisotropic etching is one of the most important techniques in photovoltaic industry. In recent years, tetramethylammonium hydroxide (TMAH) solution or a mixture of TMAH solution with IPA was reported to be used for random pyramids texturization on silicon surface due to its non-volatile, nontoxic, good anisotropic etching characteristics and uncontaminated metal ions. However, most of the studies were reported about the etching processes by using high TMAH concentration solutions. In this study, a simple and cost-effective approach for texturing mono-crystalline silicon wafers in low TMAH concentration solutions was proposed. Etching was performed on (100) silicon wafers using silicon-dissolved tetramethylammonium hydroxide (TMAH) solutions (0.5~1 ％) without addition of surfactant. The surface phenomena, surface morphology and surface reflectance have been analyzed. A textured surface with smaller and smooth pyramids can be realized by using 1 ％ silicon-dissolved TMAH solutions.
TMAH texture pyramids
OU Weiying WANG Wenjing ZHANG Yao LI Hailing ZHAO Lei ZHOU Chunlan DIAO Hongwei LIU Min LU Weiming ZHANG Jun
Key Laboratory of Solar Thermal Energy and Photovoltaic System, Institute of ElectricalEngineering, Key Laboratory of Solar Thermal Energy and Photovoltaic System, Institute of Electrical Engineering, Key Laboratory of Solar Thermal Energy and Photovoltaic System, Institute of ElectricalEngineering,
国际会议
11th IUMRS International Conference in Asia(第十一届国际材联亚洲材料大会 IUMRS-ICA 2010)
青岛
英文
26-30
2010-09-25（万方平台首次上网日期，不代表论文的发表时间）