The effect of target to substrate distance on the properties of HAZO films deposited by magnetron sputtering

摘要：

Hydrogen doped AZO films (HAZO) were prepared by RF magnetron sputtering. A systematic study of the effect of substrate to target distance (Dst) on the structural, electrical and optical properties of the as-grown HAZO films was carried out. Compared with the Al-doped ZnO films, the hydrogen in the atmosphere influenced the growth of the films by incorporating in the films and bombarding the surface of the film, namely, the Dst, which induced the residual stress and the roughness of the films decreased with an increase of the Dst. The films showed a smaller grain size. The surface work function of the films changed with the composition of the films, reaching a maximum at 7.5cm.

关键词： ZnO Magnetron sputtering target-substrate distance hydrogen

作者: W. M. Lu J. Zhang H. W. Diao L.Zhao W. J .Wang

作者单位: State Key Laboratory for Corrosion and Protection, Institute of Metal Research, Chinese Academyof Sc Laboratory of Solar Cell Technology, Institute of Electrical Engineering, The Chinese Academy ofScie Laboratory of Solar Cell Technology, Institute of Electrical Engineering, The Chinese Academy of Sci

会议类型: 国际会议

会议名称: 11th IUMRS International Conference in Asia(第十一届国际材联亚洲材料大会 IUMRS-ICA 2010)

会议地点: 青岛

会议语种:英文

页码: 134-140

在线出版日期: 2010-09-25（万方平台首次上网日期，不代表论文的发表时间）