Electrical and Optical Properties of ZnO-doped Zr0.8Sn0.2TiO4 Thin Films on ITO/Glass Substrates by RF Magnetron Sputtering
Electrical and optical properties of 1wt％ ZnO-doped (Zr0.8Sn0.2)TiO4 thin films prepared by rf magnetron sputtering on ITO/Glass substrates at different rf power and substrate temperature were investigated. The surface structural and morphological characteristics analyzed by X-ray diffraction (XRD) and atomic force microscope (AFM) were found to be sensitive to the deposition conditions, such as rf power and substrate temperature. The selected-area diffraction pattern showed that the deposited films exhibited a polycrystalline microstructure. All films exhibited ZST (111) orientation perpendicular to the substrate surface and the grain size as well as the deposition rate of the film increased with the increase in both the rf power and the substrate temperature. Optical transmittance spectroscopy further revealed high transparency (over 60％) in the visible region of the spectrum.
dielectric rf magnetron sputtering ZnO-doped Zr0.8Sn0.2TiO4 thin film
Cheng-Hsing Hsu His-Wen Yang Jenn-Sen Lin
Department of Electrical Engineering, National United University, No. 1 Lien-Da, Kung-Ching Li,Miao- Department of Materials Science and Engineering, National United University, No. 1 Lien-Da,Kung-Chin Department of Mechanical Engineering, National United University, No. 1 Lien-Da, Kung-Ching Li, Miao
国际会议
11th IUMRS International Conference in Asia(第十一届国际材联亚洲材料大会 IUMRS-ICA 2010)
青岛
英文
70-74
2010-09-25（万方平台首次上网日期，不代表论文的发表时间）