会议专题

In-Situ X-Ray Reflectivity Study of Imprint in Ferroelectric Thin Films

The structural origin of imprint in Pb(Zr,Ti)O3 (PZT) ferroelectric thin films derived by chemical solution deposition with Pt top and bottom electrodes was studied by in-situ high-resolution X-ray specular reflectivity of synchrotron radiation. Global structural parameters of density, thickness, and surface or interface roughness of each component layer in the thin film sample were obtained. No generation of interfacial layers with a different electron density from PZT and no interface roughening were observed at the interfaces of PZT and Pt during imprint. Thus, the results suggest that the imprint effect is more likely a bulk or electronic defects-related phenomenon.

ferroelectric thin films lead zirconate titanate imprint X-ray reflectivity

Jiang-Li Cao Kai Zhang Axel Solbach Zhenxing Yue Huang-Hua Wang Yu Chen Uwe Klemradt

Institute for Advanced Materials and Technology, University of Science and Technology Beijing,100083 Institute for Advanced Materials and Technology, University of Science and Technology Beijing,100083 II Physikalisches Institut B, RWTH Aachen University, D-52056 Aachen, Germany State Key Laboratory of New Ceramic and Fine Processing, Tsinghua University,100084 Beijing, China Beijing Synchrotron Radiation Facility (BSRF), Institute of High Energy Physics,Chinese Academy of S

国际会议

11th IUMRS International Conference in Asia(第十一届国际材联亚洲材料大会 IUMRS-ICA 2010)

青岛

英文

292-296

2010-09-25(万方平台首次上网日期,不代表论文的发表时间)