Analysis of ZAO Thin Films by DC reaction magnetron sputtereing

摘要：

The high quality ZAO thin films were produced by DC reaction magnetron sputtering technology. The XRD, electrical and optical properties of ZAO thin films were particularly investigated. The results show that ZAO films are polycrystalline hexagonal wurtzite structure,and Al2O3 crystal phase are not found. At the same time,the high quality ZAO films with the minimum resistivity of 4.5×10-4Ω·cm, the transmittance in visible region above 80％ and the reflectivity in IR region above 70％ are gained.

关键词： ZAO film XRD resistivity transmittance reflectivity

作者: LU Feng XU Cheng-hai WEN Li-shi

作者单位: School of Transportation and Mechanical Engineering, Shenyang Jianzhu Uinversity,Shenyang,110168,Chi School of Mechanical Engineering & Automation, Northeastern University,Shenyang 110004, China3Instit Institute of Metal Research, The Chinese Academy of Sciences, Shenyang 110015, China

会议类型: 国际会议

会议名称: 11th IUMRS International Conference in Asia(第十一届国际材联亚洲材料大会 IUMRS-ICA 2010)

会议地点: 青岛

会议语种:英文

页码: 585-590

在线出版日期: 2010-09-25（万方平台首次上网日期，不代表论文的发表时间）