Effect of annealing on formation and microstructure of ZnTiO3 thin films by DC reactive magnetron co-sputtering
Thin films of zinc titanate (ZnTiO3) can be produced on Si(100) substrates at room temperature by DC reactive magnetron co-sputtering with Ti, Zn as the target and O2 as a reactive gas. In this work, the influence of annealing temperature (500-900℃) on microstructure and formation of ZnTiO3 thin films were investigated. The samples are characterized by X-ray diffraction, transmission electron microscopy, scanning electron microscopy, atomic force microscopy, electron spectroscopy for chemical analysis. As-deposited films have an amorphous columnar structure. The crystallization phenomenon was observed with annealing temperature of 500℃. After 600℃ 2 h annealing, crystalline phase with ZnTiO3 (hexagonal) and TiO2 (rutile) could be obtained and coexisted. Furthermore, the unit cell size of the ZnTiO3 and TiO2 crystal is a = ~5.062(A),c = ~ 13.87(A) and a = ~4.58(A),c = ~ 2.95(A).
Zinc titanate Thin film Annealing Microstructure Reactive sputtering
Yen-Lin Huang Ying-Chieh Lee Du-Cheng Tsai Fuh-Sheng Shieu
Department of Materials Science and Engineering, National Chung Hsing University,Taichung 402, Taiwa Department of Materials Engineering, National PingTung University of Science & Technology,Ping-Tung Department of Materials Science and Engineering, National Chung Hsing University,Taichung 402, Taiwa Department of Materials Science and Engineering, National Chung Hsing University, Taichung 402, Taiw
国际会议
11th IUMRS International Conference in Asia(第十一届国际材联亚洲材料大会 IUMRS-ICA 2010)
青岛
英文
610-616
2010-09-25（万方平台首次上网日期，不代表论文的发表时间）