K-type Thin Film Thermocouples Deposited on Ni-based Superalloy Substrates

摘要：

NiCr-NiSi K-type thin film thermocouples with multi-layer structure were fabricated on Ni-based superalloy substrates (95 mm×35 mm×2 mm). The multi-layer structure contains NiCrAlY buffer layer (2 μm)/ thermally grown Al2O3 bond coating (200 nm)/ Al2O3 insulating layer (8μm)/ NiCr-NiSi thin film thermocouples (1μm)/ Al2O3 protecting layer (500 nm). The samples were statically calibrated in a tube furnace in the temperature range from 170℃ to 610℃. The results show that the resistance of Al2O3 insulating layer is about 14.6 kΩ at 800℃ and exceeds 100 MΩ at room temperature. The Seebeck coefficient α of the samples is about 34μV/℃, and the sensitivity coefficient K is greater than 0.8 in the temperature range from 170℃ to 610℃. The maximal sensitivity coefficient is about 0.97 at 265℃.

关键词： thin film thermocouples NiCr-NiSi Seebeck coefficient Sensitivity coefficient

作者: Y.Z. Chen C.R. Wang H.C. Jiang W.L. Zhang X.Z. Liu Y.R. Li

作者单位: State Key Laboratory of Electronic Thin Films and Integrated Devices, University of ElectronicScienc State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Scien

会议类型: 国际会议

会议名称: 11th IUMRS International Conference in Asia(第十一届国际材联亚洲材料大会 IUMRS-ICA 2010)

会议地点: 青岛

会议语种:英文

页码: 684-687

在线出版日期: 2010-09-25（万方平台首次上网日期，不代表论文的发表时间）