Study on copper nitride thin films prepared by reactive DC magnetron sputtering

摘要：

Copper nitride thin films were deposited on glass substrates by reactive DC magnetron sputtering at various N2-gas flow rates and different substrate temperature. X-ray diffraction measurements show that the films are composed of Cu3N crystallites with anti-ReO3 structure and exhibit preferential orientation to the 111 and 100. The preferred crystalline orientation of the films changes with the N2-gas flow rate and substrate temperature. The N2-gas flow rate and the substrate temperature not only affect the crystal structure of films but also affect the deposition rate, the resistivity and the microhardness of the Cu3N films.

关键词： Copper nitride thin film DC magnetron sputtering X-ray diffraction Resistivity

作者: Li Xing-ao Yang Jian-Ping Li Yong-Tao Wang Li-Xia Wang Hai-Yun

作者单位: College of Material Science and EngineeringNanjing University of Posts & Telecommunications , Nanjin College of Science, Nanjing University of Posts and Telecommunications, Nanjing 210046, China

会议类型: 国际会议

会议名称: 11th IUMRS International Conference in Asia(第十一届国际材联亚洲材料大会 IUMRS-ICA 2010)

会议地点: 青岛

会议语种:英文

页码: 706-710

在线出版日期: 2010-09-25（万方平台首次上网日期，不代表论文的发表时间）