Structural and optical properties of Zn1-xCrxO thin films deposited by magnetron sputtering
In this study, Zn1-xCrxO thin films were successfully fabricated on glass substrates by magnetron sputtering technique. The relationship between Cr doping concentration and the structural and optical characteristics of the produced samples was investigated by X-ray diffraction (XRD), optical transmittance and photoluminescence(PL). EDS results demonstrate that Cr ions are substitutionally incorporated into ZnO. XRD analysis reveals that all the prepared films with a preferential c-axis orientation exhibit the wurtzite structure of ZnO. The spectrometer transmittance data indicates that the band gap energies of the Zn1-xCrxO films are calculated by a linear fitting method. The band gap is found to be large with the increasing dopant concentration. The PL spectra suggest that all the samples have an ultraviolet emission peak centered at 370 nm. With the improved Cr-doped concentration, the peaks of ultraviolet emission have a blue shift to the region of higher photon energy, which is coincident with those values calculated by the linear fitting from the transmittance data. It is also found that the intensity of ultraviolet emission has been remarkably improved when Cr content is approximately 2.0at.％, but it is decreased when doping concentration of Cr is excessively high.
Zn1-xCrxO thin film magnetron sputtering blue shift photoluminescence
Changfeng FU Lianfu HAN Chao LIU Ximing CHEN
School of Electronic Science, Northeast Petroleum University, Daqing 163318, China School of Electronic Science, Northeast Petroleum University, Daqing 163318, China School of Electri Tianjin Key Laboratory of Film Electronic and Communication Device, Tianjin University of Technology
国际会议
11th IUMRS International Conference in Asia(第十一届国际材联亚洲材料大会 IUMRS-ICA 2010)
青岛
英文
750-755
2010-09-25（万方平台首次上网日期，不代表论文的发表时间）