Evaluation on Microstructure of Aluminum alloys Dedicated to Plasma Etcher
The relationship between microstructure and anodic oxidation film on 6061 aluminum alloy dedicated to plasma etcher were mainly studied by OM, SEM and TEM. The results show that the quality of anodic oxidation film has close relationship with the microstructure of materials, the distribution of element and the morphology of secondary phases. The microstructure of foreign 6061 aluminum alloy is uniform, and there are not obviously segregation and cavity. Two kinds of secondary phases disperse over the grain, one is rich-Fe phase, and the other is Mg2Si. Certainly there are also few secondary phases distributing along the grain boundary. The sizes of all secondary phases are almost below 5μm. The size of rich-Fe phases in homemade aluminum alloys are about from 2μm to 15μm, these big-size phases will bring pin-hole defects, which form some channels sending F+ etc. into the matrix of aluminum alloy, then not only the equipment will be destroyed at last, but also products will be polluted. The evaluation on microstructure of aluminum alloy will provide scientific basis for nationalization of plasma etcher.
6061 aluminum alloys anodic oxidation film microstructure
Zhang Zhihui Liu Shufeng Sun Zeming Yan Xiaodong
General Research Institute for Nonferrous Metals, Beijing 100088, China
国际会议
11th IUMRS International Conference in Asia(第十一届国际材联亚洲材料大会 IUMRS-ICA 2010)
青岛
英文
343-349
2010-09-25（万方平台首次上网日期，不代表论文的发表时间）