A Method of Tip-sample Distance Control Based on Electrostatic Force in Maskless Microplasma Scanning Etching

摘要：

In cantilever-based microplasma etching system proposed by our group, the controlling of tip-sample distance is important for maskless canning etching. This paper presents a tip-sample controlling method based on electrostatic force. Theoretical model to calculate the electrostatic force between the conductive probe and the sample is established. The relationship of the electrostatic force and the tipsample distance under different bias voltages is investigated by experiments based on AFM. Both the theory and experiments prove that this electrostatic force is feasible for maskless scanning plasma etching with the etching distance of l-2μm.

关键词： microplasma scanning etching distance controlling electrostatic force

作者: Leili Cheng Li Wen Zhen Yuan Dun Niu Liwen He Jiaru Chu

作者单位: Department of Precision Machinery and Precision Instrumentation, University of Science and Technology of China, Hefei, China

会议类型: 国际会议

会议名称: 2011 International Conference on Electronics and Optoelectronics(2011电子学与光电子学国际会议 ICEOE 2011)

会议地点: 大连

会议语种:英文

页码: 1208-1211

在线出版日期: 2011-07-29（万方平台首次上网日期，不代表论文的发表时间）