Design and Analysis of a MEMS Tunable Inductor Based on UV Lithography of SU-8

摘要：

This paper reports the design of a tunable radiofrequency (RF) inductor and analyses the parameters that influence the quality factor (Q) of the inductor, hi our paper we mainly discuss the influence of the thickness of the metal layer on the Q when other parameters are fixed.In order to achieve the high thickness, we use SU-8 as our photoresist instead of the traditional photoresist. Through the analysis, we calculate out the thickness of the metal layer is 23um when the Q reaches to maximum.

关键词： quality factor (Q) inductor UV Lithography SU-8

作者: Xianghong Li Jianlin Liu Binzhen Zhang Xiangjiao Meng Changhong Ji

作者单位: Key Labortatory of Instrumentation Science & Dynamic Measurement (North University of China),Ministry of Education,Taiyuan,China

会议类型: 国际会议

会议名称: 2011 2nd International Conference on Material and Manufacturing Technology(2011第二届材料与制造技术国际会议 ICMMT2011)

会议地点: 厦门

会议语种:英文

页码: 36-41

在线出版日期: 2011-07-08（万方平台首次上网日期，不代表论文的发表时间）