Two-step Gas Treatment of Commercially Pure Titanium for Anatase Layer For-mation
A two-step gas treatment of commercially pure titanium (CP Ti) was investigated with a focus on the formation of the anatase phase. The first step was carried out in Ar-1％CO atmosphere at 1073 K for 0 ks or in N2 atmosphere at 1123 K for 14. 4 ks. The subsequent second step was carried out in air at 473873 K for 0 ks and 86. 4 ks. A titanium oxycarbide (TiC1-xOx) layer was formed after the first-step treatment in Ar-1％ CO atmosphere,and an anatase-rich TiO2 layer was obtained after the second-step treatments in air at 673-873 K for 0 ks and at 573773 K for 86. 4 ks. In particular,single-phase anatase formed under the condition of the second step in air at 573 K for 86. 4 ks. The anatase fraction in reaction layer could be controlled by varying the temperature and holding time of the second step. Both the TiN and Ti2 N phases were detected as reaction products after the first step in N2 atmosphere,and an anatase-containing TiO2 layer was obtained after the second-step treatment in air at 723 K for 86. 4 ks. The formation of TiN and its oxidation at low temperatures seem to be required for the preparation of an anatase-containing TiO2 layer on Ti.
Titanium (Ti) surface treatment thermal oxidation titanium oxycarbide (TiC1-xOx) titanium nitride anatase
Nobuyuki Umetsu Takuro Okazumi Kyosuke Ueda Takayuki Narushima
Department of Materials Processing,Tohoku University,Sendai 980-8579,Japan
国际会议
The 12th World Conference Titanium(第十二届世界钛会 Ti-2011)
北京
英文
2106-2110
2011-06-19（万方平台首次上网日期，不代表论文的发表时间）