A Calculation Model for the Film Thickness and Component Uniformity of Twin Co-Sputtering Target System

摘要：

In the vacuum film coating field, the cosputtering method by two or more targets has been widely used for coating the composite film consisted of a variety of component elements. In this paper, a typical co-sputtering system is studied which composes the twin round planar magnetron sputtering targets settled symmetrically and slantways towards a single flat substrate with self-rotation. A model is set up to describe the non-dimensional relationship between the film thickness and the structural parameters of co-sputtering system, such as distance of the substrate-to-targeth, symmetrical eccentricitye, translation lengthd and obliquity angle of targetα. On the assumption that the sputtered particles are emitted in the direction of cosine distribution and fly straightly without collision scattering, the depositing rate distribution, film thickness distribution, the utilization ratio of the target sputtering material, and the fluctuant ratio of the components from two targets are calculated. Some of simulating examples are given by use of Matlab software.

关键词： vacuum film coating co-sputtering modeling film thickness distribution component uniformity

作者: Shiwei Zhang Liyuan Hou Yongchao Han Yuanhua Xie

作者单位: School of Mechanical Engineering and Automation,Northeastern University,P.R.China

会议类型: 国际会议

会议名称: 2010 International Conference on Material and Manufacturing Technology(2010材料与制造技术国际会议 ICMMT2010)

会议地点: 重庆

会议语种:英文

页码: 218-223

在线出版日期: 2010-09-17（万方平台首次上网日期，不代表论文的发表时间）