Field Emission of Aluminum Nitride Nanocones Deposited on Titanium Substrate

摘要：

We report the preparation of quasi-arrays of aluminum nitride nanocones via chemical vapor deposition on nitriding treated titanium substrate at 800 ℃ through the reaction between AlCl3 vapor and NH3/N2 gas. The field emission measurement exhibits a fine electron emission with the turn-on field of 10.7 V/mm, which is quite smaller than the turn-on field of 41.3 V/μm for aluminum nitride nanocones deposited on silicon wafer in our previous works. The reduction of turn-on field is attributed to the formation of a layer of conductive tiannium nitride on titanium substrate during the nitriding treatment.

关键词： field emission aluminum nitride nanocone titanium substrate

作者: Yemin Hu Zheng Hu Fan Zhang Ying Li Mingyuan Zhu Shiwei Wang

作者单位: School of Materials Science and Engineering,Shanghai University,Shanghai 200072,P.R.China Key Laboratory of Mesoscopic Chemistry of MOE and Jiangsu Provincial Lab for NanoTechnology,School o

会议类型: 国际会议

会议名称: 2010 International Conference on Material and Manufacturing Technology(2010材料与制造技术国际会议 ICMMT2010)

会议地点: 重庆

会议语种:英文

页码: 476-481

在线出版日期: 2010-09-17（万方平台首次上网日期，不代表论文的发表时间）