Process Optimization and Structural Characterization of Fe3Si Layer by Pulse Electrodeposition
Fe3Si layer was prepared by pulse eletrodeposition of Si on the surface of non-oriented steel in molten salts. With an orthogonal test the optimal process parameters were determined: the formulation of salts was NaCl:KCl:NaF:SiO2=l: 1:3:0.3 (mole ratio), current density of 60 mA/ cm2, duty cycle of 30%, pulse period of 1000 (is and a deposition time of 50 min, respectively. The compositional depth profile, the structure, the surface morphology and cross sectional micrograph of the layer were studied by glow discharge spectrometry (GDS), X ray diffraction (XRD), scanning electron microscopy (SEM) and optical microscope (OM). The results showed that Si in the layer existed in the form of the gradient distribution. The phase structure of the layer was composed of the singlephase Fe3Si. The layer composed of equiaxed grains. The surface appeared smooth and dense, and with uniform thickness.
Pulse electrodeposition Fe3Si layer Process optimization
YANG Haili Gao Aimin LI Yungang WANG Fujia ZHANG Yuzhu
College of Metallurgy and Energy,Hebei Polytechnic University,Tangshan,063009,China College of Mecha College of Metallurgy and Energy,Hebei Polytechnic University,Tangshan,063009,China
国际会议
2010 International Conference on Material and Manufacturing Technology(2010材料与制造技术国际会议 ICMMT2010)
重庆
英文
1201-1205
2010-09-17(万方平台首次上网日期,不代表论文的发表时间)