ELECTRON BEAM DIRECT WRITING TECHNOLOGY AND APPLICATION IN THE RESEARCH OF HIGH FREQUENCY SAWDEVICES
Communication technologies develop very fast in recent years, especially mobile communication technology. One of the key parts of communication system is the SAW device, which development directions are high frequency, low insert loss and miniaturization. As the frequency is higher, requirement of optical lithography technology increases and the conventional contact lithography technology is inefficient. Three kind of lithography is ideal: UV projection lithography, Electron beam direct writing technology and X-ray lithography. In order to reduce fabrication cost and development cycle, a variably shaped electron beam lithography system (JBX-6AII, JOEL, 1980) was adopted. This system was mainly used for optical lithography reticle fabrication, and it had a low resolution of lμm. In order to develop the potential capability of the electron beam direct writing system, specially designed substrate exposure clamp, electron beam proximity effect correction graphic design technology and different shaped beam size combination exposure technology were adopted, and the parameter of resist coating, pre-bake, exposure dose, hard bake, etching temperature and time were optimized. As a result, this system got a resolution of 0.5μm. In this paper, research and batch fabrication task of SAW filter (900MHz, 1272MHz, 1575.42MHz and 2300MHz, etc) and SAW resonator (1320MHz and 1440MHz, etc) were successfully completed.
Electron beam Exposure optical lithography.
Zi kun FAN Xiao yang Chen Xu ming Bian
Beijing Changfeng SAW company, Beijing 100854
国际会议
深圳
英文
254-259
2011-12-09（万方平台首次上网日期，不代表论文的发表时间）