Moisture Related Instability in p-Type Low Temperature Polycrystalline Silicon Thin Film transistors
The unreliable behaviors of low temperature polycrystalline silicon (LTPS) thin film transistors (TFTs) after a period of storage are confirmed to be related to the moisture by the observation of enhanced negative bias temperature instability (NBTI) after humidity treatments and the observation of decreased NBTI degradation after hard bake treatment. PECVD passivation layers of combined SiO2 and Si3N4 deposited on the top of low temperature LTPS TFT structure can effectively prevent the moisture from penetrating into the TFT structure and improve the device reliability.
low temperature polycrystalline silicon thin film transistors moisture related instability passivation layer
Meng ZHANG Wei ZHOU Shuyun ZHAO Hoi Sing KWOK
Center for Display Research and Department of Electronic and Computer Engineerin The Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong, China
国际会议
China Display/Asia Display 2011(2011年中国显示/亚洲显示会议)
江苏昆山
英文
427-430
2011-11-07(万方平台首次上网日期,不代表论文的发表时间)