Effect of Ar/O2 Ratio and Substrate Temperature on the Hydrophilicity of SiO2Thin Films Prepared by RF Reactive Magnetron Sputtering
SiO2 thin films were prepared on stainless steel substrate by RF reactive magnetron sputtering. Their microscopic surface morphology was characterized by atomic force microscope (AFM) and static contact Angle (SCA) was applied to evaluate hydrophilicity of films. It was found that SiO2 thin films showed super hydrophilicity which could last long at Ar/O2 ratio of 6:4; under such condition, substrate temperature also affects hydrophilicity of films, the best of which can be obtained at 90 °C.
Ar/O2 Ratio Substrate Temperature SiO2 Thin Films Super Hydrophilicity
Song-Hua Gao Li-Hua Gao
Shool of Physics and Mechanical & Electrical Technology, Sanming University, Sanming 365004, China
国际会议
大连
英文
842-845
2011-10-19(万方平台首次上网日期,不代表论文的发表时间)