Synthesis and characterization of TiO2 thin film by self-assembly method
(0) TiO2 thin films were deposited on SAM-coated silicon substrate by layer-by-layer self-assembly method. The influence of various parameters was investigated to optimize the conditions and. the results show that with increasing deposition temperature and deposition time, and decreasing molar ratio of HC1 to TiO22+ the content of TiO22+ in the reaction solution decreases. The as-deposited thin films were fully amorphous from the result of XRD, also were homogeneous and continuous produced at 80 °C for 120 min as presented in SEM images, and the average size of particles on the thin film surface is approximately 33 nm.
Layer-by-layer deposition Self-assembly method TiO2 Thin film
Wennning Mu Shuangzhi Shi
Department of Materials Science and Engineering, Northeastern University at Qinhuangdao Branch, Qinh Qinhuangdao ShouGang Plate Co., Ltd, Qinhuangdao 066003, PR China
国际会议
大连
英文
1500-1503
2011-10-19（万方平台首次上网日期，不代表论文的发表时间）