Size Distributions of Ambient Aerosol in the Vicinity of Semiconductor Plants
This study was conducted from November, 2009 to July, 2010 at a semiconductor plant in a science park in southern Taiwan to understand the characteristics of ambient atmospheric aerosol using a micro-orifice uniform deposition impactor (MOUDI) and a nano-MOUDI equipped with Teflon filters (with diameters of 37 and 47 mm, respectively) in the vicinity of semiconductor plants. The sampling periods covered three types of days: episode days (PM concentration > 100 冚g m-3), sunny days, and sunny days after rain. The particle mean concentrations of PM1, PM2.5, PM2.5-10, and PM10 followed the order episode days > sunny days > sunny days after rain; however, the mean concentration of PM0.1 was in order sunny days after rain > sunny days > episode days. Episode day and sunny day samples exhibited a similar bi-modal particle size distribution within the size range 0.01100 冚m, with a major and a secondary peak in the coarse and fine size ranges, respectively. The particles collected on sunny days after rain displayed a trimodal distribution, with a major, a secondary, and a minor peak in the coarse (3.25.6 冚m), fine (0.561.0 冚m), and nano (0.010.032 冚m) size ranges, respectively. With an additional minor peak in the nano size range (0.0180.032 冚m), the particles collected following rain had a trimodal size distribution.
Size Distribution Ultrafine Semiconductor Plant Washout.
Chih-Chung Lin Shui-Jen Chen Jen-Hsiung Tsai Kuo-Lin Huang hun-Li Chou
Department of Environmental Science and Engineering,National Pingtung University of Science and Tech Content Engineering Consulting Services,Ltd.,New Taipei City,Zhonghe Dist.,23553,Taiwan
国际会议
西安
英文
907-910
2011-08-17（万方平台首次上网日期，不代表论文的发表时间）