Effect of Ti Incorporation on the Micrestructure and Prop-erties of the a-C:H Films Deposited by Magnetron Sput-tering Technique
Amorphous hydrogenated carbon (a-C:H) and Tiincorporated a-C:H (Ti/a-C:H) films were deposited by magnetron sputtering with a mixture gas of CH4 and Ar. The effect of the Ti incorporation on the chemical composition, microstructure and properties of the as-deposited and the annealed films were investigated by various techniques. It has been shown that the bonding structure and the internal stress were sensitive to the incorporation of the Ti atoms. The results of the XPS revealed that the concentration of Ti atom on the surface of the film increased when the Ti/a-C:H film annealed at 300 ℃. The tribologcial properties of the (Ti/)a-C:H films changed greatly after annealed, due to the graphitization, oxidation of carbon, and so forth. It compared and discussed in detail the change of the microstructure and properties of the a-C:H and Ti/aC:H films before and after annealed
(Ti)/a-C:H film magnetron sputtering annealing microstructure tribological properties
Wang Yongxia Ye Yinping Li Hohgxuan Ji Li Wang Yongjun Wu Yanxia LiuXiaohong Chen Jianmin Zhou Huidi
State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of
国际会议
西安
英文
366-370
2011-05-11（万方平台首次上网日期，不代表论文的发表时间）