Application of Plasma Enhanced Chemical Vapor Deposi-tion for Fingerprint Resistance
SiO, and diamond-like carbon (DLC) coatings as the fingerprint resistance and corrosion resistance layers were deposited by capacitively coupled plasma (CCP)-enhanced chemical vapor deposition powered by radio frequency (RF-PECVD). In here hexamethyldisiloxane (HMDSO) as monomer for SiOx coating, C2H2 as the carbon source for DLC growth precursor, and Ar as the dilution gas were utilized. The important factors affected fingerprint resistance was explored in detail. Besides, the corrosion resistant test on coatings and substrates were then examined by the potentiodynamic polarization measurement and salt-spray corrosion test, respectively. The chemical structure and composition of SiOx and DLC films were analyzed by FTIR, and the relationship between them and anti-corrosion property was discussed. The results show that the DLC coating demonstrates a better anti-fingerprint behavior than that of coated SiCv especially in acidic solution environment.
SiOx and DLC coatings CCP fingerprint resistance corrosion resistance
Lei Wenwen Chen Qiang Qi Fengyang Yang Lizhen Liu Zhongwei Wang Zhengduo
Beijing Institute of Graphic Communication, Beijing 102600, China
国际会议
西安
英文
433-438
2011-05-11（万方平台首次上网日期，不代表论文的发表时间）