The Deposition Rate of Ti Film by Plasma

摘要：

Ti film on AISI 201 was prepared by plasma. The film was characterized by SEM. Their deposition rates were measured by measure the mess of Ti film(m) and the preparation time(t). SEM show that the more time is, the thicker Ti films is. The stronger power is, the thicker Ti films is. And the far the distance is, the more thin Ti films is. It was found that the deposition rates range from 0.02 mg.min to 0.025 mg.min-1 at the area of 6.25cm2. The deposition rate of titanium film change with the deposition power range from 0.021 mg.min1 to 0.163 mg.min-1. The deposition rate of titanium film change with the deposition power range from 0.096 mg.min-1 to 0.130 mg.min-1. The deposition rate of titanium film change with the deposition negative bias range from 0.008 mg.min-1 to 0.02mg.min at the area of 6.25cm2.

关键词： Ti film deposition rate time

作者: Shuanghua Huang Qi Lai

作者单位: Panzhihua University, Panzhihua, Sicuan, China. 617000

会议类型: 国际会议

会议名称: 2011 International Conference on Mechatronics and Materials Processing(2011年机电一体化与材料加工国际会议 ICMMP)

会议地点: 广州

会议语种:英文

页码: 1220-1223

在线出版日期: 2011-11-18（万方平台首次上网日期，不代表论文的发表时间）