ELECTROHYDRODYNAMIC ANALYSIS FOR AN ELECTRICALLY ENHANCED NANOIMPRINT LITHOGRAPHY

摘要：

Nano Imprint Lithography (NIL) is a nano scale patterning process potentially applicable in various sectors of nanotechnology.But in conventional NIL, a large external pressure has to be used to press a patterned template against fluid (a polymer, for instance) on a substrate so that the fluid hydraulically fills into cavity of the template while compressing the air trapped inside the cavity.Such a large and mechanically applied force will lead to various undesirable distortions in the template or process tool.Application of an electric potential to the template and substrate can generate an electrostatic force to the dielectric fluid between them and tends to pull the liquid into the cavity, so that the external force required can be reduced.In this paper, a numerical analysis has been performed of the electrostatic force and the influence of electric field on the process of electrically enhanced nanoimprint lithography (EEN1L).

关键词： Electrically enhanced nanoimprint lithography Electrohydrodynamic Dielectric fluid instability

作者: HONGMIAO TIAN JINYOU SHAO YUCHENG DING HONGZHONG LIU

作者单位: State Key Laboratory for Manufacturing Systems Engineering School of Mechanical Engineering,Xian Jtaotong University

会议类型: 国际会议

会议名称: 3rd International Conference on Mechanical and Electrical Technology(ICMET2011) (2011第三届机械与电气技术国际会议)

会议地点: 大连

会议语种:英文

页码: 431-435

在线出版日期: 2011-08-26（万方平台首次上网日期，不代表论文的发表时间）